Adisyn fires up ALD system to fast-track graphene solutions for next-gen chips

• Beneq TFS 200 ALD system commissioned at Adisyn subsidiary 2D Generation’s research facility in Israel
• Dual-system setup established with a second next generation ALD unit at Tel Aviv University
• The dual setup enables Adisyn to fast-track its low-temp graphene interconnects for next-gen semiconductor chips

Special Report:  Semiconductor innovator Adisyn has taken a key step in commercialising its low-temperature graphene technology, with installation, commissioning and calibration of a next-generation Atomic Layer Deposition (ALD) system at the Israel research facility of subsidiary 2D Generation. 

ALD machines are widely used in the semiconductor industry to deposit extremely thin layers (down to an atom thickness) of material onto chips.

ALD systems are found in most advanced semiconductor fabs around the globe with Adisyn Ltd (ASX: AI1) specifically selecting a model customised by Finnish company Beneq, as part of its broader strategy to commercialise its low-temperature ALD graphene technology.

The Beneq TFS 200 ALD system brings a significant performance uplift over legacy equipment with specific benefits including:

• Plasma options for wafer surface treatments and potential introduction of reactive gases that catalyse graphene growth;
• Semi-automatic load lock enables room-temperature sample exchange, reducing heating/cooling times; and
• Reaction chamber suitable for wafer-scale processing.

AI1 said the system featured enhanced process control, wider operational temperature thresholds and significantly higher throughput compared to previously used equipment

The capabilities are considered essential for advancing AI1’s proprietary low-temperature graphene deposition process, which aims to overcome existing performance barriers in semiconductor interconnects.

Capability lifted with infrastructure upgrade

To support the advanced platform, major infrastructure upgrades were completed at 2D Generation’s Yakum-based facility, including new environmental controls and high-spec electrical systems designed to meet the strict operating parameters of ALD-based research.

The delivery of the new ALD system adds to Adisyn’s existing access to a Beneq TFS 200 system at Tel Aviv University’s Jan Koum Center for Nanoscience and Nanotechnology – a strategic partnership announced in March.

The newly commissioned system will operate in parallel with the unit at Tel Aviv University.

Together the dual-system configuration will enable 2D Generation to run concurrent testing and accelerate validation of graphene films across various substrates, layer structures and operating conditions.

With both ALD systems operational, 2D Generation will start validating previous technical results while broadening its understanding of the building blocks for a robust, scalable process.

An update on its development roadmap is scheduled this quarter.

Watch: Adisyn’s big plans for chip technology

‘Major operation leap for Adisyn’

AI1 chairman Kevin Crofton said the newly commissioned system marked a significant step forward in the company’s ability to advance and commercialise its graphene interconnect technology.

“Commissioning the new ALD system represented a major operational leap for Adisyn,” Crofton said.

“The precision, flexibility, and throughput of this platform enables us to rigorously test our graphene interconnect solution under real-world semiconductor conditions.

“Used in parallel with the ALD system at Tel Aviv University, we now have a powerful dual-platform setup to accelerate development, validate performance, and build a strong foundation for commercial application.”

This article was developed in collaboration with Adisyn, a Stockhead advertiser at the time of publishing.

This article does not constitute financial product advice. You should consider obtaining independent advice before making any financial decisions.